臺式化學機械研磨拋光設備

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• 更新時間：2025-12-05

產(chǎn)品簡介：

CMP Tribo 臺式化學機械研磨拋光設備,The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes, including their associated wafer, pad and slurry interactions.

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CMP Tribo 臺式化學機械研磨拋光設備簡介：

The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes, including their associated wafer, pad and slurry interactions. Primary application areas for the Tribo system are in the field of CMP planarization or delayering,

with secondary applications in the field of Tribological science and research.

CMP Tribo 臺式化學機械研磨拋光設備特點：

Ø Superior real time analytical capabilities

Ø Consistent, repeatable performance

Ø Enhanced control at your fingertips

Ø Adaptable and portable - Logitech quality as standard